Notre Dame Integrated Imaging Facility

FEI-HELIOS DUAL BEAM FIB

The Helios NanoLab™ Workstation is capable of: 

Helios FIB Workstation

  •   nano-prototyping
  •   nano-machining
  •   nano-analysis 
  •   advanced TEM sample preparation 

Specifications

Electron optics: 

  • Resolution:  0.9 nm @ 15 kV, 1.4 nm @ 1 kV 
  • Detection: in-lens SE and BSE 

Ion optics: 

Sidewinder™ field emission focused ion beam optics with liquid Gallium ion emitter;  

  • Resolution: 5.0 nm @ 30 kV
  • Detection: CDEM detector

Application:

  • Patterning:  Simultaneous imaging and patterning with end-point detection  through Real-Time Monitor
  • AutoFIB
  • Platinum Deposition;
  • Selective Carbon Mill
  • Enhanced Etch
  • TEM sample preparation: AutoTEM G2;  Omniprobe AutoProbe 200.2
  • Diagnostics:  EDS& EBSD and Pegasus Package, EDAX 

 

electron gate     Nano Antenna

Electron Gate: Ion Beam Milling         Nano Antenna : Platinum Deposition

 

OCP-HA Layer

OCP-HA layer on Ti substrate: IB Milling